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M series - Dual target DC and one RF sputtering targets up to 150mm 

Key Features


  • DC and RF power suply for conductive and non-conductive materials

  • Equipped with TMp and rotary pumps

  • Full range vacuum gauge

  • Three 2” water - cooled sputtering cathodes

  • Large chamber suitable for large specimens

  • Target selection for multilayer thin films

  • co-sputtering to form alloy films

  • Two Quartz crystal monitoring system for real time thickness measurement (1 nm precision)

  • Manual or automatic Timed and Thickness deposition

  • Intuitive touch screen to control the coating process and rapid data input

  • User friendly software that can be updated via network

  • Equipped with electronic shutter

  • Equipped with rotary sample holder with the ability of tilting in direction of cathodes

  • 500 °C substrate heater

  • 300 V DC substrate bias voltages

  • Unlimited sputtering time without breaking vacuum

    • Options
      • Thermal evaporation insert

      • High current power supply

      • Sputtering targets

      • Thermal source materials

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